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BUSINESS AREA
Semiconductor Process Equipment
- Anisotropic etching of all types of silicon-based films for ULSI devices
- Etching of GaAs, GaN, InP and other compound semiconductor materials
- Low-damage etching of III-V compounds
- Fabrication of waveguide devices
- Etching of metal films — Cr, Al, W, Au, Pt and others
- Patterned sapphire etching for LED
- Polymer etch, photoresist strip and surface cleaning
- High-rate and high-quality deposition of undoped and germanium-doped (for waveguides) silicon dioxide
- High-quality silicon nitride deposition with stress control
- Amorphous silicon deposition
- Silicon oxynitride deposition
- Poly-silicon deposition
- Silicon carbide deposition